The effect of deposition rate aluminum cathode on the performance of organic light emitting diode

Q: How can I download an article?

To download an article from SID, first log in to the site, search for the article title, and click on the 'Download Article' option.

Q: How can I download an ISI article?

To download an ISI article on SID, enter the keyword or article title in the search bar, view the relevant results, click on the desired article, and select the 'Download Article' option.

Q: How can I access the SID database?

To access the SID database, visit SID.ir, create an account, and log in to access scientific resources.

Q: Is downloading articles from SID free?

Some articles on SID are available for free, while others require payment. Details are specified on the article's page.

Shariatiniya Fatemeh; Fadavieslam Mohammad Reza

مرکز اطلاعات علمی Scientific Information Database (SID) - Trusted Source for Research and Academic Resources

Journal Paper

Paper Information

Journal: NANOSCALE Year:2023 | Volume:10 | Issue:1 Page(s): 48-53

Download Full-Text

Persian Verion

View:

Download:

Cites:

Information Journal Paper

Title

The effect of deposition rate aluminum cathode on the performance of organic light emitting diode

Author(s)

Shariatiniya Fatemeh | Fadavieslam Mohammad Reza | Issue Writer Certificate

Keywords

organic light emitting diode

aluminum cathode

Deposition rate

Abstract

In this research, the effect of aluminum cathode Deposition rate on its structure and performance of organic light emitting diode (OLED) with Glass/ITO/PEDOT:PSS/ALq3 structure was investigated. The aluminum Deposition rate was considered to be 0.1, 0.5, 1 and 2 nm/s. The structure of aluminum films was studied by X-ray diffraction (XRD), field emission scanning electron microscope (FESEM) and atomic force microscope (AFM). The results of structural characterization showed that the films prepared with rates of 0.1 and 0.5 nm/s have polycrystalline structure corresponding to the cubic phase of aluminum with a peak in the direction of the (111) plane. The morphology of the surface of the films is granular. Also, increasing the aluminum Deposition rate cause to enhancing the size of grains and their surface roughness. The current-voltage characterization of diodes showed their diode behavior. In general, increasing Deposition rate decreases the threshold voltage of the diodes. Light emitting spectroscopy of diodes showed that increasing the Deposition rate of cathode cause to enhancing the intensity of their emitted light, but does not change the wavelength of the emitted light.

Multimedia

No record.

Cites

No record.

References

No record.

Cite

Related Journal Papers

No record.

Related Seminar Papers

No record.

Related Plans