In this paper the electroDEPOSITION of nickel on n-Si (111): H substrate, in the presence of sulphuric acid, was studied. Cyclic voltammetry has been used to characterize the ELECTROCHEMICAL behavior of the system. The nickel deposits had a flower-like morphology with the sphericalnanostructure nucleus, distributed uniformly on the surfaces of the prepared n-Si (111) substrate.