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Title

MEASUREMENT OF THICKNESS AND ELECTROPHYSICAL PARAMETERS OF DIELECTRIC AND METALIC THIN FILMS BY OPTICAL AND MICROWAVE METHODS

Pages

 Start Page 30 | End Page 33

Abstract

 The possibility to determine the thickness and ELECTROPHYSICAL PARAMETERS of thin dielectric and metal films in sandwich- like structures using the results of measurement of reflection and transmission spectra in MICROWAVE and optical band are shown. The results of measurement of refractive index of SnO2 in the thickness range of 40 nm to 2800 nm and the results of measurement of CONDUCTIVITY of Cr-films applied to ceramic substrates are presented.

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