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Title

DIAMOND GROWTH ON ALUMINIUM SUBSTRATE BY HFCVD USING DIFFERENT ETCHING GASSES

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 Start Page 19 | End Page 22

Abstract

 Diamond nano crystals and nano crystalline diamond films have been synthesized on an Aluminium substrate by Hot Filament Chemical Vapor Deposition (HFCVD) system in a CH4/H2 gas mixture. This study focuses on the effect of ETCHING GASSES, N2, NH3, and, H2 on diamond growth on AL SUBSTRATE. The optimal conditions were found to be: gas flow rate = 330 sccm, substrate temperature Ts = 500°C, and reaction pressure = 30 Torr. Good quality DIAMOND NANO CRYSTALS with (111) crystallite were grown on the AL SUBSTRATE by H2 as the etching gas. In terms of morphology, the analyses were carried out by Scanning Electron Microscopy (SEM). The crystallinity of the Diamond nano crystal films and nano crystalline diamonds were analyzed by X-Ray Diffraction (XRD) analysis.

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