In this project, the optimization of RF Magnetron Sputtering Cathode is performed on the existing cathode made by High Vacuum Technology Center of ACECR. As a domestic innovation, ANSYS Magnetic Field Modeling Tool was employed and proper physical and technological constraints were applied to the virtual model and the best configuration was obtained. Then the results of the simulation were implemented in the mechanical design of the cathode, considering all practical design aspects. The new cathode was put under various tests. The quantitative parameters which were studied include magnetic field strength at the target level, maximum power, maximum rate of deposition, target utilization and electrical isolation. The experiments indicate that the power of more than 1kw at pressures less than 50 militorr is achievable and a rate of deposition of 20nm/sec can be reached. Also, ease of assembling and disassembling, good target cooling, wide range of plasma stability and weight reduction was realized. Tests with 600w RF Generator and matching box showed a very good operation and specifically a wide range of matching at 200w.