Prototype broad beam ion source for ion beam sputter deposition was designed and fabricated, for the first time in our country. In this project, after conceptual design and recognition of the key parameters of the source, construction design of its components was prepared in detail, using reverse engineering and computer simulation. Furthermore, in order to evaluate the operation of the plasma source and the extraction system, an experimental setup was arranged and many tests were performed for understanding the role of the control parameters. The constructed source is capable of generating an ion beam with diameter of 5 cm, energy of 700 eV and current of 90 mA. The hot cathode plasma source of this ion source operates at a pressure of 1 microbar.