SIO2 THIN LAYERS IN THICKNESSES (1, 5, 10, 18 NM) ON THE TIO2 THIN LAYER IN THICKNESS 79 NM DEPOSITED BY REACTIVE RF SPUTTERING TECHNIQUE. THE DEPOSITED FILMS WERE ANNEALED AT (200, 300, 400, 500, 600OC). THE SURFACE PROPERTIES OF THIN FILMS BY ATOMIC FORCE MICROSCOPY (AFM), SURFACE CHEMICAL COMPOSITION BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS), PHOTOCATALYTIC TIO2 UNDERLAYER BY THE UV LIGHT IRRADIATION AND HYDROPHILIC PROPERTIES OF THE FILMS, WERE STUDIED.