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Paper Information

Title: 

FABRICATION AND CHARACTERIZATION OF NIO NANORODS GROWN BY RF SPUTTERING: OPTICAL AND HYDROPHILIC STUDY

Type: PAPER
Author(s): EBRAHIMI MAHDI,BAYAT AMIR,MOSHFEGH ALIREZA
 
 
 
Name of Seminar: NATIONAL VACUUM CONFERENCE IRAN
Type of Seminar:  CONFERENCE
Sponsor:  PAZHOHESHKADE OLOM VA SANAYE GHAZAEE
Date:  2012Volume 5
 
 
Abstract: 

IN THIS RESEARCH, AT FIRST RF SPUTTERING METHOD WAS USED TO GROW THIN FILMS OF NICKEL ON THE GLASS LAME SUBSTRATE AND THEN THE FILMS WERE ANNEALED AT DIFFERENT TEMPERATURES IN PURE OXYGEN AT ATMOSPHERIC PRESSURE .ACCORDING TO IMAGES ANALYSIS OF SCANNING ELECTRON MICROSCOPY (SEM),THE PRODUCED NANOSTRUCTURES HAVE NANOROD SHAPE WITH DIAMETER OF ABOUT 30 - 40 NM. A BAND GAP ENERGY BETWEEN 3.7 TO 3.8 EV IS MEASURES BASED ON OPTICAL MEASUREMENTS. IN ADDITION, IT WAS ALSO FOUND THAT CONTACT ANGLE OF UNANNEALED SPECIMEN, WAS110OC INDICATING HYDROPHOPIC SURFACE AND REDUCE TO 33OC FOR THE ANNEALED SAMPLE AT 300OC SHOWING ITS STATE HYDROPHILICITY.

 
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