Paper Information

Title: 

CHARACTERIZATION AND FABRICATION BY COMBINATION OF PLASMA SPUTTERING AND THERMAL OXIDATION ELECTRO- OPTICAL THIN FILM ZNO: AL

Type: PAPER
Author(s): MIRZAYE TAGHI,ZAHED HOSSEIN
 
 
 
Name of Seminar: NATIONAL VACUUM CONFERENCE IRAN
Type of Seminar:  CONFERENCE
Sponsor:  PAZHOHESHKADE OLOM VA SANAYE GHAZAEE
Date:  2012Volume 5
 
 
Abstract: 

THE INTEREST IN DUSTY PLASMA RESEARCH, WHICH IS A RELATIVELY NEW FIELD IN PLASMA PHYSICS, HAS INCREASED WITH THE DEVELOPMENT OF MICROELECTRONICS. THE DUST PARTICLES APPEAR AS POLLUTANT IN THIS INDUSTRIAL PROCESSING. RECENTLY, HOWEVER, THEY ARE SEEN FROM A DIFFERENT POINT OF VIEWS – THEY CAN BE USEFUL IN COATINGS VARIOUS TECHNOLOGIES FOR MICROELECTRONIC, OPTIC, ELECTRO-OPTIC INDUSTRIAL. IN THIS INVESTIGATION WE HAVE CONCENTRATED ON COATING OF DUST PARTICLES BY ZNO: AL THIN FILM. DUST PARTICLES IN THE INVESTIGATION ARE ZN, AL. THIN FILMS ARE FABRICATION BY COMBINATION OF PLASMA SPUTTERING ZN, AL AND THERMAL OXIDATION. THESE THIN FILMS HAVE SPECIAL PHYSICAL PROPERTIES, SUCH AS LARGE BOND STRENGTH, ZNO THIN FILMS EXHIBIT HIGH TRANSPARENCY IN VISIBLE REGION AND LOW ELECTRICAL RESISTIVELY. THE ELECTRICAL AND OPTICAL PROPERTIES OF ZNO: AL THIN FILMS WERE EVALUATED BY XRD, RBS, THE LINEAR FOUR POINT PROBE METHOD AND VISIBLE SPECTROSCOPY. 85.45.BZ VACUUM MICROELECTRONIC DEVICE CHARACTERIZATION, DESIGN, AND MODELING.

 
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