Paper Information

Title: 

THIN FILM DEPOSITION BY CYLINDRICAL SPUTTERING CATHODE

Type: PAPER
Author(s): SALEHI MARYAM,ZAVARIAN ALI ASGHAR,GHOTBI S.M.JAMAL
 
 
 
Name of Seminar: NATIONAL VACUUM CONFERENCE IRAN
Type of Seminar:  CONFERENCE
Sponsor:  ANJOMANE KHALA IRAN-DANESHGAHE SHAHID BEHESHTI AHVAZ
Date:  2014Volume 6
 
 
Abstract: 

THERE ARE SOME METHODS TO DEPOSIT THIN FILMS ON THE INTERNAL WALLS OF CYLINDRICAL BODIES WHICH THE BEST OF THEM IS A CYLINDRICAL SPUTTERING CATHODE. IN THIS RESEARCH, FOR THE FIRST TIME WE HAVE USED A CYLINDRICAL UN- COOLED CATHODE WITH CONSTANT OUTSIDE MAGNETRON TO DEPOSIT A THIN COPPER FILM ON THE INTERNAL WALL OF A STEEL CYLINDER. THE RATE OF DEPOSITION WAS 30 A/SEC. IN THIS EXPERIMENT, A CYLINDRICAL COPPER BAR WITH SUITABLE DIAMETER USED AS THE CATHODE AND STEEL HALLOW CYLINDER CONCENTRIC TO IT AS THE ANODE. THE BASE PRESSURE WAS 6.7×10-5MBAR AND THE ARGON PRESSURE CONSTANT AT 1.1×10-2 MBAR THROUGHOUT THE EXPERIMENT. IN THIS PAPER, FIRST THE PHYSICS OF CYLINDRICAL SPUTTERING IS DESCRIBED IN BRIEF AND THEN THE EXPERIMENT OF THIN FILM DEPOSITION BY CYLINDRICAL MAGNETRON CATHODE AND ITS RESULTS ARE EXPLAINED. FINALLY THE CONCLUSIONS ARE EXPRESSED.

 
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