Click for new scientific resources and news about Corona[COVID-19]

Paper Information

Title: 

STRUCTURAL, CHEMICAL AND MORPHOLOGICAL PROPERTIES OF TITANIUM INSERTED COPPER NITRIDE NANO-CRYSTALLINE THIN FILMS

Type: PAPER
Author(s): RAHMATI ALI*
 
 *DEPARTMENT OF PHYSICS, FACULTY OF SCIENCES, VALIE ASR UNIVERSITY OF RAFSANJAN, RAFSANJAN
 
Name of Seminar: NATIONAL VACUUM CONFERENCE IRAN
Type of Seminar:  CONFERENCE
Sponsor:  ANJOMANE KHALA IRAN-DANESHGAHE SHAHID BEHESHTI AHVAZ
Date:  2014Volume 6
 
 
Abstract: 

TI INSERTED COPPER NITRIDE (TI: CU3N) THIN FILMS WERE DEPOSITED ON SI (111) SUBSTRATES USING A BINARY TI13CU87 ALLOYED TARGET BY REACTIVE DC MAGNETRON SPUTTERING AT NITROGEN AMBIENT ATMOSPHERE. THIS STUDY PROVIDES INSIGHT INTO THE IMPORTANCE OF NITROGEN PRESSURE ON THE CHARACTERISTIC OF THE AS-DEPOSITED TI: CU3N THIN FILMS. PHASE ANALYSIS OF THESE FILMS WAS IDENTIFIED BY X-RAY DIFFRACTION (XRD) TECHNIQUE. THE FILMS INDICATE GOOD CRYSTALLINITY WITH TI SUBSTITUTED CU SITES AND VACANCIES IN THE CU3N STRUCTURE. FOR ATOMIC TI: CU RATIO PREDICTION IN THE FILMS, A MODEL HAS BEEN INTRODUCED BASED ON SEMI-EMPIRICAL FORMULATION OF SPUTTERING. THE ATOMIC TI: CU RATIO IS LESS THAN THAT OF THE ORIGINAL TARGET AND IT DEPENDS ON MAGNETRON DISCHARGE CHARACTERISTICS.
TI ADDITION AND SUBSEQUENT EXCESS OF INTERSTITIAL NITROGEN (N- RICH), RESULTS IN LATTICE CONSTANT EXPANSION IN COMPARISON WITH TI FREE CU3N AND GRAIN GROWTH SUPPRESSION.

 
Keyword(s): 
 
 
Yearly Visit 46   tarjomyar
 
Latest on Blog
Enter SID Blog