IN THIS WORK, WE PRESENT A NUMERICAL ANALYSIS OF NEAR FIELD DIFFRACTION EFFECT OF MICRON SIZED CONTACT MASKS IN FORMATION OF MATERIAL SURFACE STRUCTURING UNDER PULSED LASER IRRADIATION. THE ANALYSIS INCLUDES THE RAYLEIGH- SOMMERFELD DIFFRACTION FORMULA WITH ARRHENIUS TYPE ABLATION MODEL FOR THE MATERIALS. THE RESULTS HAVE BEEN PRESENTED IN SILICON FOR CONTACT MASK SIZES OF 10*10 MM2, 20*20 MM2, 30*30 MM2, AND 50*50 MM2.