WOX FILMS WERE DEPOSITED BY LASER ABLATION OF WO3 TARGETS AT 250OC TEMPERATURE, 100 MTORR OXYGEN PARTIAL PRESSURE AND 1×10-5 TORR VACUUM. SURFACE CHEMICAL STATES OF DEPOSITS WERE DETERMINED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS). RESULTS SHOWED THAT DEPOSITS IN OXYGEN PARTIAL PRESSURE CONTAINS W6+WITH X~3.1, WHILE VACUUM DEPOSITS HAVE DIFFERENT W STATES PERCENTAGE DISTRIBUTION AS W4+> W5+> W6+> W0, AND X~1. WE USED ELECTRICAL RESISTANCE MEASUREMENTS TO STUDY THE SUB-STOICHIOMTRY IN VACUUM DEPOSITION PROCESS. FAST MEASUREMENT OF FILM RESISTANCE IN VACUUM DEPOSITION REVEALED SOME MICROSECOND FLUCTUATIONS MODULATED ON THE TIME VARIATION CURVE OF ELECTRICAL RESISTANCE.