Titanium dioxide thin films with a thickness of 280 nm were deposited using pulsed DC magnetron reactive sputtering,on glass substrates. In order to deposit a Ti source in an Ar+O2 gas mixture was used with a substrate of temperature 2500c.The X-ray diffraction (XRD) showed anatase phases and Topographical surface using atomic force microscopy (AFM) is studied. Then RF plasma system was changed and treatment effect of N2 + O2 mixture plasma on the reduction concentration of methylene blue dye in the presence of TiO2 thin films evaluated. Finally, the color removal rate (R%) and also degradation reaction rate constant (k) is calculated.characterized.