Paper Information

Journal:   CERAMIC SCIENCE & ENGINEERING   WINTER 2017 , Volume 5 , Number 4 #E0045; Page(s) 45 To 55.
 
Paper: 

INVESTIGATION OF PLASMA TREATMENT EFFECT OF N2+O2 MIXTURE PLASMA ON THE PHOTOCATALYTIC PROPERTIES OF TITANIUM DIOXIDE THIN FILMS

 
 
Author(s):  JAMEYI MARYAM, HAGHIGHAT ZADEH AZADEH*, MAZINANI BABAK
 
* 
 
Abstract: 

Titanium dioxide thin films with a thickness of 280 nm were deposited using pulsed DC magnetron reactive sputtering,on glass substrates. In order to deposit a Ti source in an Ar+O2 gas mixture was used with a substrate of temperature 2500c.The X-ray diffraction (XRD) showed anatase phases and Topographical surface using atomic force microscopy (AFM) is studied. Then RF plasma system was changed and treatment effect of N2 + O2 mixture plasma on the reduction concentration of methylene blue dye in the presence of TiO2 thin films evaluated. Finally, the color removal rate (R%) and also degradation reaction rate constant (k) is calculated.characterized.

 
Keyword(s): PLASMATREATMENT, TIO2, PHOTOCATALYST
 
References: 
  • ندارد
 
  Persian Abstract Yearly Visit 53
 
Latest on Blog
Enter SID Blog