Click for new scientific resources and news about Corona[COVID-19]

Paper Information

Journal:   JOURNAL OF THEORETICAL AND APPLIED PHYSICS (IRANIAN PHYSICAL JOURNAL)   JUNE 2009 , Volume 3 , Number 1; Page(s) 19 To 22.
 
Paper: 

DIAMOND GROWTH ON ALUMINIUM SUBSTRATE BY HFCVD USING DIFFERENT ETCHING GASSES

 
 
Author(s):  KHALAJ Z.*, TAHERI S.Z., NASIRI LAHEGHI S., ALIZADEH ESLAMI P.
 
* PHYSICS DEPARTMENT, ISLAMIC AZAD UNIVERSITY, TEHRAN NORTH BRANCH, TEHRAN, IRAN
 
Abstract: 

Diamond nano crystals and nano crystalline diamond films have been synthesized on an Aluminium substrate by Hot Filament Chemical Vapor Deposition (HFCVD) system in a CH4/H2 gas mixture. This study focuses on the effect of etching gasses, N2, NH3, and, H2 on diamond growth on Al substrate. The optimal conditions were found to be: gas flow rate = 330 sccm, substrate temperature Ts = 500°C, and reaction pressure = 30 Torr. Good quality diamond nano crystals with (111) crystallite were grown on the Al substrate by H2 as the etching gas. In terms of morphology, the analyses were carried out by Scanning Electron Microscopy (SEM). The crystallinity of the Diamond nano crystal films and nano crystalline diamonds were analyzed by X-Ray Diffraction (XRD) analysis.

 
Keyword(s): ETCHING GASSES, DIAMOND NANO CRYSTALS, HFCVD, AL SUBSTRATE
 
 
References: 
  • Not Registered.
  •  
  •  
 
Citations: 
  • Not Registered.
 
+ Click to Cite.
APA: Copy

KHALAJ, Z., & TAHERI, S., & NASIRI LAHEGHI, S., & ALIZADEH ESLAMI, P. (2009). DIAMOND GROWTH ON ALUMINIUM SUBSTRATE BY HFCVD USING DIFFERENT ETCHING GASSES. JOURNAL OF THEORETICAL AND APPLIED PHYSICS (IRANIAN PHYSICAL JOURNAL), 3(1), 19-22. https://www.sid.ir/en/journal/ViewPaper.aspx?id=191582



Vancouver: Copy

KHALAJ Z., TAHERI S.Z., NASIRI LAHEGHI S., ALIZADEH ESLAMI P.. DIAMOND GROWTH ON ALUMINIUM SUBSTRATE BY HFCVD USING DIFFERENT ETCHING GASSES. JOURNAL OF THEORETICAL AND APPLIED PHYSICS (IRANIAN PHYSICAL JOURNAL). 2009 [cited 2021June22];3(1):19-22. Available from: https://www.sid.ir/en/journal/ViewPaper.aspx?id=191582



IEEE: Copy

KHALAJ, Z., TAHERI, S., NASIRI LAHEGHI, S., ALIZADEH ESLAMI, P., 2009. DIAMOND GROWTH ON ALUMINIUM SUBSTRATE BY HFCVD USING DIFFERENT ETCHING GASSES. JOURNAL OF THEORETICAL AND APPLIED PHYSICS (IRANIAN PHYSICAL JOURNAL), [online] 3(1), pp.19-22. Available: https://www.sid.ir/en/journal/ViewPaper.aspx?id=191582.



 
  pdf-File
Yearly Visit 41
 
 
Latest on Blog
Enter SID Blog