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Paper Information

Journal:   JOURNAL OF NUCLEAR SCIENCE AND TECHNOLOGY   2006 , Volume - , Number 1 (36); Page(s) 41 To 48.
 
Paper: 

CARBON NANOTUBES GROWTH USING THERMAL CHEMICAL VAPOR DEPOSITION (TCVD) AT ATMOSPHERIC PRESSURE

 
 
Author(s):  MOJTAHEDZADEH LARIJANI M.*, NABIPOUR CHAKOLI A., LAHOUTI SH., NOVINROUZ A.A.J., AFSHARI NARGES
 
* NUCLEAR RESEARCH CENTER FOR AGRICULTURE AND MEDICINE, AEOI, KARAJ, IRAN
 
Abstract: 

Carbon nanotubes (CNTs) were grown on nickel catalysts by thermal chemical vapor deposition (TCVD), using CH4 as precursors, at atmospheric pressure. Ion beam sputtering has been used for Ni deposition on various silicon substrates. In this study, the effect of oxided silicon surface on the Ni agglomeration and CNTs growth was investigated, using scanning electron microscopy (SEM) and micro-Raman. SEM results show the role of silicon oxide film on the silicon (SiO2/Si), concerning agglomeration of Ni layer and hence, the CNTs growth. The graphite structure of the tubes was confirmed by Raman spectroscopy.

 
Keyword(s): CARBON NANOTUBES, CATALYST, ION BEAMS SPUTTERING, RAMAN SPECTROSCOPY
 
 
References: 
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+ Click to Cite.
APA: Copy

MOJTAHEDZADEH LARIJANI, M., & NABIPOUR CHAKOLI, A., & LAHOUTI, S., & NOVINROUZ, A., & AFSHARI, N. (2006). CARBON NANOTUBES GROWTH USING THERMAL CHEMICAL VAPOR DEPOSITION (TCVD) AT ATMOSPHERIC PRESSURE. JOURNAL OF NUCLEAR SCIENCE AND TECHNOLOGY, -(1 (36)), 41-48. https://www.sid.ir/en/journal/ViewPaper.aspx?id=104980



Vancouver: Copy

MOJTAHEDZADEH LARIJANI M., NABIPOUR CHAKOLI A., LAHOUTI SH., NOVINROUZ A.A.J., AFSHARI NARGES. CARBON NANOTUBES GROWTH USING THERMAL CHEMICAL VAPOR DEPOSITION (TCVD) AT ATMOSPHERIC PRESSURE. JOURNAL OF NUCLEAR SCIENCE AND TECHNOLOGY. 2006 [cited 2021August01];-(1 (36)):41-48. Available from: https://www.sid.ir/en/journal/ViewPaper.aspx?id=104980



IEEE: Copy

MOJTAHEDZADEH LARIJANI, M., NABIPOUR CHAKOLI, A., LAHOUTI, S., NOVINROUZ, A., AFSHARI, N., 2006. CARBON NANOTUBES GROWTH USING THERMAL CHEMICAL VAPOR DEPOSITION (TCVD) AT ATMOSPHERIC PRESSURE. JOURNAL OF NUCLEAR SCIENCE AND TECHNOLOGY, [online] -(1 (36)), pp.41-48. Available: https://www.sid.ir/en/journal/ViewPaper.aspx?id=104980.



 
 
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