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Paper Information

Journal:   JOURNAL OF SCIENCES (ISLAMIC AZAD UNIVERSITY)   SPRING 2006 , Volume 16 , Number 59 (PHYSICS ISSUE); Page(s) 23 To 28.
 
Paper: 

FABRICATING TI2ALN NANOLAMINATE BY DC MAGNETRON SPUTTERING

 
 
Author(s):  HANTEHZADEH M.R.*, GOUDARZI S.
 
* PLASMA PHYSICS RESEARCH CENTER, SCIENCE AND RESEARCH CAMPUS, ISLAMIC AZAD UNIVERSITY, TEHRAN, IRAN
 
Abstract: 

We report on the fabrication of Ti2AlN in this article. Thin films of the Mn+1AXn phase ( M: early transition metal; A: A-group element; X: C and/ or N; n=1-3) Ti2AlN were grown on Ti, Si and glass substrate from a Ti and Al compound target with an Ar/N2 gas mixture using DC magnetron sputtering system. X-ray diffraction and atomic force microscopy (AFM) were used to characterize the Ti2AlN (004) structure and morphology of the samples.

 
Keyword(s): TI2ALN, DC MAGNETRON SPUTTERING, NANOLAMINATION, THIN FILMS
 
References: 
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