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Journal:   JOURNAL OF ADVANCED MATERIALS AND TECHNOLOGIES   spring 2020 , Volume 9 , Number 1 ; Page(s) 19 To 31.
 
Paper: 

Characterization Of Nanostructure Coatings Of Ti-Al-C-N System Deposited Using Plasma Assisted Chemical Vapor Deposition
 
 
Author(s):  Rashidi Mahshid, Tamizifar Morteza*, Boutorabi Seyyed Mohammad Ali
 
* Department of Metallurgy and Materials Engineering, University of Science and Technology, Tehran, Iran
 
Abstract: 
In this study, titanium aluminium carbonitride (TiAlCN) ceramic coatings with different amount of Al were deposited at 350 ° C on H13 hot work tool steel substrates, using pulsed-DC plasma assisted chemical vapor deposition method. Energy-dispersive X-ray spectroscopy (EDS), Fourier-transform infrared spectroscopy (FTIR), glancing incidence X-ray diffraction method (GIXRD), transmission electron microscopy (TEM), Raman spectroscopy, field emission scanning electron microscopy (FE-SEM) and SEM and atomic force microscopy (AFM) were applied for characterizing of the coatings. Microhardness test utilized for evaluating of microhardness of the coatings. The coatings showed a nanostructure consisted of fcc-TiAlN and hcp-AlN nanocrystalline grains and an amorphous carbon phase. Increasing the amount of Al from ~10 to ~42 at. % led to a decrease of the surface roughness of the coating from 151± 49 to 88± 27 nm, due to the creation of more nuclei of AlN. Coating with the less amount of Al (~10 at. %) presented the highest microhardness of about 3840 HV0. 01, due to the less amount of chloride impurity and hcp-AlN phase.
 
Keyword(s): Coating,Nanostructure,TiAlCN,PACVD
 
 
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APA: Copy

Rashidi, M., & TAMIZIFAR, M., & Boutorabi, S. (2020). Characterization of Nanostructure Coatings of Ti-Al-C-N System Deposited using Plasma Assisted Chemical Vapor Deposition. JOURNAL OF ADVANCED MATERIALS AND TECHNOLOGIES, 9(1 ), 19-31. https://www.sid.ir/en/journal/ViewPaper.aspx?id=740240



Vancouver: Copy

Rashidi Mahshid, TAMIZIFAR MORTEZA, Boutorabi Seyyed Mohammad Ali. Characterization of Nanostructure Coatings of Ti-Al-C-N System Deposited using Plasma Assisted Chemical Vapor Deposition. JOURNAL OF ADVANCED MATERIALS AND TECHNOLOGIES. 2020 [cited 2022May17];9(1 ):19-31. Available from: https://www.sid.ir/en/journal/ViewPaper.aspx?id=740240



IEEE: Copy

Rashidi, M., TAMIZIFAR, M., Boutorabi, S., 2020. Characterization of Nanostructure Coatings of Ti-Al-C-N System Deposited using Plasma Assisted Chemical Vapor Deposition. JOURNAL OF ADVANCED MATERIALS AND TECHNOLOGIES, [online] 9(1 ), pp.19-31. Available: https://www.sid.ir/en/journal/ViewPaper.aspx?id=740240.
 
 
Persian Abstract Yearly Visit 54
 
 
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